Plasma Treatment and Plasma Polymerization by Self-Oscillating 2-MHz Generator

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  • Iriyama Yu
    Division of Interdisciplinary Sciences,University of Yamanashi
  • Tanaka Keita
    Division of Interdisciplinary Sciences,University of Yamanashi
  • Yamaguchi Sayaka
    Division of Interdisciplinary Sciences,University of Yamanashi

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A 2-MHz generator was used for plasma treatment and plasma polymerization and compared with 13.56-MHz plasma. Without a matching unit, the 2-MHz generator can match the impedance by adjusting its frequency to create stable plasma, which is called "self-oscillation". Unlike the ordinary rf generator, as another advantage, the 2-MHz generator showed little radio-wave interference. In the O2 plasma treatment of HDPE and PP plates, the surfaces became hydrophilic for both the frequencies, in which 2 MHz showed superior treatment effect to 13.56 MHz. In the plasma polymerization of CHF3 and C2H4, the deposition rate in 2-MHz plasma was lower than that in 13.56 MHz. However, the properties of the deposited films were alike.

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