Time-resolved fluorescence decay analysis of photoresis film by GaN LD pumped single-photon counting method
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- Kaji Makoto
- Hitachi Chemical Co., Ltd., Electronic Materials R&D Center
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- Muramatsu Yukiko
- Hitachi Chemical Co., Ltd., Electronic Materials R&D Center
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- Nishimura Yoshinobu
- University of Tsukuba, Graduate School of Pure and Applied Science
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- Arai Tatsuo
- University of Tsukuba, Graduate School of Pure and Applied Science
書誌事項
- タイトル別名
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- Time-resolved Fluorescence Decay Analysis of Photoresist Film by GaN LD Pumped Single-Photon Counting Method
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抄録
In order to study photoinitiating mechanism of photochemically initiated radical polymerization in thick negative photoresist, fluorescence lifetime analyses of dry film photoresist were conducted by gallium nitride semiconducter laser pumped single-photon counting method. Lifetimes of photosensitizers, 4-methyl-7-(N,N-diethyl)aminocoumarin (C1), 4,4'-(N,N,N',N'-tetraethy)aminobenzophenon (EAB), 1-phenyl -3-[2-(4''-t-butylphenyl)vinyl]-5-(4'''-t-butyl) phenylpyrazoline (Pyraz) or 9,10-di-n-butoxyanthracene in film resists with and without photoinitiator, 2,2'-bis (σ-methylphenyl)-4,4',5,5'-tetraphenyl- imidazole (Me-HABI), as a quencher were successfully obtained. Quenching efficiencies, η, defined as 1-(τ/τ0), were compared with photoinitiaing efficiencies which were obtained by RT-FTIR measurement of double bond disappearance and photospeed determined by gray scale step method. From correlation between quenching efficiencies and photoinitiating efficiencies in an extent, it was elucidated that the singlet excited state of photosensitizer seems to involve in the photoinitiation process as an important process.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 20 (2), 265-269, 2007
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詳細情報 詳細情報について
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- CRID
- 1390001204324252672
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- NII論文ID
- 130004464540
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD2sXot1Wnurw%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 8918875
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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- 使用不可