Low Temperature Curable Negative-tone Photo-sensitive Transparent Materials
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- Okazawa Toru
- Electronic and Imaging Materials Research Laboratories, Toray Industries, Inc.
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- Ono Koichiro
- Electronic and Imaging Materials Research Laboratories, Toray Industries, Inc.
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- Suwa Mitsuhito
- Electronic and Imaging Materials Research Laboratories, Toray Industries, Inc.
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説明
Novel Low Temperature Curable (140 °C) Negative-tone Photo-sensitive Transparent coating was developed by using functional siloxane resin. The functional group in siloxane react by UV exposure to proceed thermal cross linking of silanol by restricting molecular motion of silanol groups. This property made the functional siloxane coating low temperature curable. On the other hand siloxane without functional group was not observed by this reaction accelerating phenomenon. The functional siloxane base negative photosensitive transparent coating exhibits excellent pencil hardness at low temperature curing, excellent transparency even after high temperature treatment, ideal pattern profile as well as good adhesion to various substrates. The developed material is ideal for application of photo-spacer, an insulator, a protection layer and others of various types of optical devices.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 25 (3), 349-353, 2012
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詳細情報 詳細情報について
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- CRID
- 1390001204324315520
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- NII論文ID
- 130004833468
- 40019347719
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BC38XhtFegsbzN
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 023822510
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDLサーチ
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
