Influence of Polymer Wall Formation on Alignment Behaviors of Ferroelectric Liquid Crystal Devices
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- Takeshi Murashige
- NHK Science & Technical Research Laboratories
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- Hideo Fujikawa
- NHK Science & Technical Research Laboratories
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- Hiroto Sato
- NHK Science & Technical Research Laboratories
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- Hiroshi Kikuchi
- NHK Science & Technical Research Laboratories
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- Taichiro Kurita
- NHK Science & Technical Research Laboratories
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- Fumio Sato
- NHK Science & Technical Research Laboratories
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Abstract
We clarified that polymer networks generated in polymer wall formation increase a threshold voltage for switching of a ferroelectric liquid crystal (FLC) near the polymer walls, from electron/optical microscopy and electrooptic measurement of FLC/polymer composite films. The polymer walls were formed by ultraviolet light irradiation to an FLC/monomer solution through a photomask. The ultraviolet light spreading from the photomask formed the undesirable polymer networks near the polymer walls. The decrease in the light spreading angle and monomer concentration reduced the generation of the polymer networks, which improved the FLC switching behaviors with applied voltages.
Journal
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 18 (1), 27-32, 2005
The Society of Photopolymer Science and Technology(SPST)
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Details 詳細情報について
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- CRID
- 1390001204324467712
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- NII Article ID
- 130004464416
- 40006743853
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- NII Book ID
- AA11576862
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- ISSN
- 13496336
- 09149244
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- NDL BIB ID
- 7337856
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed