Plasma polymerization of perfluoroalkanes over zeolite membrane and the gas permeability of the membrane.
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- KITA HIDETOSHI
- Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University
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- SHIGEKUNI MASANOBU
- Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University
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- TANAKA KAZUHIRO
- Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University
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- OKAMOTO KEN-ICHI
- Department of Advanced Materials Science and Engineering, Faculty of Engineering, Yamaguchi University
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- KAWAFUNE ISAO
- Osaka Municipal Technical Research Institute
抄録
Plasma polymerization of perfluoro-n-hexane, hexafluoroethane and tetrafluoromethane is investigated. The deposition rate of plasma- polymerized perfluoro-n-hexane increased with increasing discharge power up to 40W and then sharply decreased, while hexafluoroethane and tetrafluoromethane hardly polymerized. Addition of hydrogen or methane increased the polymer deposition rate because of hydrogen scavenging of fluorine atoms formed in the plasma.. A maximum in the deposition rate was observed in the 40 mol% hydrogen or in the 20 mol% methane addition to perfluoro-n-hexane or hexafluoroethane. FTIR and XPS spectra showed plasma-polymerized membranes have the crosslinking structure. The gas permeation through plasma-polymerized membranes deposited on zeolite, alumina-gel membrane and porous polycarbonate substrate is also reported.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 8 (3), 385-392, 1995
フォトポリマー学会
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詳細情報 詳細情報について
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- CRID
- 1390001204324522752
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- NII論文ID
- 130003488912
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- COI
- 1:CAS:528:DyaK2MXnslKksLw%3D
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- ISSN
- 13496336
- 09149244
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可