Nanopatterning of Vapor-deposited Aminosilane Film using EB Lithography for Ferritin Protein Adsorption

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  • Kumagai Shinya
    Advanced Technology Research Laboratories, Matsushita Electric Industrial Co., Ltd.
  • Yoshii Shigeo
    Advanced Technology Research Laboratories, Matsushita Electric Industrial Co., Ltd.
  • Yamada Kiyohito
    Advanced Technology Research Laboratories, Matsushita Electric Industrial Co., Ltd.
  • Fujiwara Isamu
    Graduate School of Materials Science, Nara Institute of Advanced Science and Technology
  • Matsukawa Nozomu
    Advanced Technology Research Laboratories, Matsushita Electric Industrial Co., Ltd.
  • Yamashita Ichiro
    Advanced Technology Research Laboratories, Matsushita Electric Industrial Co., Ltd. Graduate School of Materials Science, Nara Institute of Advanced Science and Technology

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High-density ferritin nanopatterning - the protein and core complex - on a silicon substrate was achieved using nanometric patterns of amino-group modification. These patterns were made through a combination of EB lithography and vapor-phase deposition of 3-aminopropyltriethoxysilane (APTES). An appropriate buffer solution, with respect to pH and Debye length, suppressed ferritin adsorption on the SiO2 underlayer while ferritins were adsorbed with high density on a nanometer-size APTES layer. We obtained 50-nm patterned ferritins by using a solution with a 1000-nm Debye length (pH 7.0); with this solution, the attractive ferritin-APTES interaction seemed to be strong enough to overcome the repulsive ferritin-SiO2 interaction.

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