Nanopatterning of Vapor-deposited Aminosilane Film using EB Lithography for Ferritin Protein Adsorption
-
- Kumagai Shinya
- Advanced Technology Research Laboratories, Matsushita Electric Industrial Co., Ltd.
-
- Yoshii Shigeo
- Advanced Technology Research Laboratories, Matsushita Electric Industrial Co., Ltd.
-
- Yamada Kiyohito
- Advanced Technology Research Laboratories, Matsushita Electric Industrial Co., Ltd.
-
- Fujiwara Isamu
- Graduate School of Materials Science, Nara Institute of Advanced Science and Technology
-
- Matsukawa Nozomu
- Advanced Technology Research Laboratories, Matsushita Electric Industrial Co., Ltd.
-
- Yamashita Ichiro
- Advanced Technology Research Laboratories, Matsushita Electric Industrial Co., Ltd. Graduate School of Materials Science, Nara Institute of Advanced Science and Technology
この論文をさがす
抄録
High-density ferritin nanopatterning - the protein and core complex - on a silicon substrate was achieved using nanometric patterns of amino-group modification. These patterns were made through a combination of EB lithography and vapor-phase deposition of 3-aminopropyltriethoxysilane (APTES). An appropriate buffer solution, with respect to pH and Debye length, suppressed ferritin adsorption on the SiO2 underlayer while ferritins were adsorbed with high density on a nanometer-size APTES layer. We obtained 50-nm patterned ferritins by using a solution with a 1000-nm Debye length (pH 7.0); with this solution, the attractive ferritin-APTES interaction seemed to be strong enough to overcome the repulsive ferritin-SiO2 interaction.
収録刊行物
-
- Journal of Photopolymer Science and Technology
-
Journal of Photopolymer Science and Technology 18 (4), 495-500, 2005
フォトポリマー学会
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1390001204324669440
-
- NII論文ID
- 130004464442
- 40006743930
-
- NII書誌ID
- AA11576862
-
- COI
- 1:CAS:528:DC%2BD2MXmtVOqsLk%3D
-
- ISSN
- 13496336
- 09149244
-
- NDL書誌ID
- 7338451
-
- 本文言語コード
- en
-
- データソース種別
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- 抄録ライセンスフラグ
- 使用不可