Studying Resist Stochastics with the Multivariate Poisson Propagation Model
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- Naulleau Patrick
- Center for X-ray Optics, Lawrence Berkeley National Laboratory
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- Anderson Christopher
- Center for X-ray Optics, Lawrence Berkeley National Laboratory
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- Chao Weilun
- Center for X-ray Optics, Lawrence Berkeley National Laboratory
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- Bhattarai Suchit
- EECS, University of California
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- Neureuther Andrew
- EECS, University of California
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Progress in the ultimate performance of extreme ultraviolet resist has arguably decelerated in recent years suggesting an approach to stochastic limits both in photon counts and material parameters. Here we report on the performance of a variety of leading extreme ultraviolet resist both with and without chemical amplification. The measured performance is compared to stochastic modeling results using the Multivariate Poisson Propagation Model. The results show that the best materials are indeed nearing modeled performance limits.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 27 (6), 747-750, 2014
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詳細情報 詳細情報について
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- CRID
- 1390001204324678272
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- NII論文ID
- 130004833574
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- NII書誌ID
- AA11576862
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 026010974
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可