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- Hong Xiaoyin
- Dept. of Chem., Tsinghua Univ.
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- Duan Shengquan
- Dept. of Chem., Tsinghua Univ.
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- Lu Jianping
- Dept. of Chem., Tsinghua Univ.
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- Wang Peiging
- Dept. of Chem., Tsinghua Univ.
書誌事項
- タイトル別名
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- Studies on the Reaction of Development-
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抄録
Based on the reaction of vapor HF and SiO2 at a temperature of above 100°C, development-free vapor photolithography (DFVP) eliminates the development step in conventional process. Under the etching condition, only in the presence of accelerators can the etching reaction occur. The accelerators catalyze this nucleophilic reaction by raising the nucleophilic activity of HF or activating the leaving group in substrate. Photochemical reaction leads to the concentration difference of accelerators between exposed area and unexposed area and thus results in the area-selective etching.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 11 (1), 173-179, 1998
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詳細情報 詳細情報について
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- CRID
- 1390001204324748672
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- NII論文ID
- 130003488043
- 40005351777
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DyaK1cXkslamsLo%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 4525877
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可