Novel Fluorinated Compounds that Improve Durability of Antistick Layer for Quartz Mold

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  • Yamashita Tsuneo
    Chemical R &D Center, Daikin Industries, Ltd.
  • Iyoshi Syuso
    Laboratory of Advanced Science and Technology for Industry, University of Hyogo
  • Okada Makoto
    Laboratory of Advanced Science and Technology for Industry, University of Hyogo
  • Matsui Shinji
    Laboratory of Advanced Science and Technology for Industry, University of Hyogo

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In recent years, the reduction in pattern size is driving the rapid adoption of nanoimprint lithography (NIL). Since nanoimprinting is contact printing, high separation forces might damage the master and/or the imprint tool, either of which degrades pattern quality. One of the biggest concerns in NIL utilization is the mold-release characteristic of the master and the resin. Although Optool DSX (DAIKIN Ind. Ltd.) is a defacto standard as mold anti-sticking reagent, there is a problem with its UV-NIL durability. Accordingly, we focused on developing new fluorinated low molecular weight compounds to enhance the mold-release characteristic of the resist. This paper reports that resists containing these fluorinated compounds offer improved durability as anti-stick layers for quartz molds even under repeated UV-NIL exposure.

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