Breakthrough Achievement In Nanoimprint Lithography Using PFP Condensable Gas

DOI Web Site Web Site 被引用文献2件 参考文献33件
  • Matsui Shinji
    Laboratory of Advanced Science and Technology for Industry, University of Hyogo JST-CREST
  • Hiroshima Hiroshi
    Research Center for Ubiquitous MEMS and Micro Engineering, National Institute of Advanced Science and Technology JST-CREST
  • Hirai Yoshihiko
    Graduate School of Engineering, Osaka Prefecture University JST-CREST
  • Nakagawa Masaru
    Institute of Multidisciplinary Research for Advanced Materials, Tohoku University JST-CREST

この論文をさがす

抄録

The effectiveness of condensable gas, used as ambience, in UV nanoimprint lithography has been demonstrated. Bubble defect problem, which is inherent in UV nanoimprint under non vacuum ambience, can be solved by PFP condensable gas. UV nanoimprint lithography using PFP was validated for 45 nm pattern fabrication under thin residual layer conditions, which are required for UV nanoimprint used as UV nanoimprint lithography. PFP reduces the viscosity and demolding force of UV curable resins. These properties are helpful in increasing the throughput and reliability of UV nanoimprint. PFP occasionally produces large shrinkages, and degrades pattern quality depending on UV curable resin. These drawbacks can be mitigated by selecting UV curable monomers with a low PFP absorption. In the end, we have demonstrated the satisfied LER and LWR values requested in 22 nm node NAND flash memories and 20,000 repeated imprints with a single mold by UV nanoimprint using PFP.

収録刊行物

被引用文献 (2)*注記

もっと見る

参考文献 (33)*注記

もっと見る

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ