Chemical Patterns Fabricated by Nanoimprinting for Block Copolymer Directed Self-Assembly
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- Wakaba Hitomi
- Graduate School of Science, University of Hyogo
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- Okada Makoto
- Graduate School of Science, University of Hyogo
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- Iyoshi Syuso
- Graduate School of Science, University of Hyogo
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- Haruyama Yuichi
- Graduate School of Science, University of Hyogo
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- Matsui Shinji
- Graduate School of Science, University of Hyogo
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We demonstrated the fabrication process of chemically patterned templates by UV and thermal nanoimprintings for DSA and carried out microphase separation of PS-b-PMMA on the templates. The microdomain structure of PS-b-PMMA was occurred and it was influenced by chemical pattern. The results indicate that nanoimprint process is a useful method to fabricate the chemical pattern.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 27 (1), 99-102, 2014
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詳細情報 詳細情報について
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- CRID
- 1390001204324836608
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- NII論文ID
- 130004678327
- 40020133276
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- NII書誌ID
- AA11576862
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 025604428
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可