Photocrosslinking of Blends of Multifunctional Diphenylfluorene Derivatives and Polysilanes Using Visible Light

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  • Okamura Haruyuki
    Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
  • Funamoto Kenji
    Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
  • Matsumoto Akikazu
    Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University
  • Minokami Keiko
    Fine Chemicals Development Center, Osaka Gas Chemicals Co., Ltd.
  • Miyauchi Shinsuke
    Fine Chemicals Development Center, Osaka Gas Chemicals Co., Ltd.

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Abstract

We have devised the photocrosslinked films of diphenylfluorene and polysilanes blends on irradiation at 405 nm. Photo-decomposition of Si-Si bonds of polysilanes was successfully suppressed during irradiation of the visible light. The photocrosslinking properties were strongly affected by PEB conditions and irradiation dose. The sensitivity of PMPS/BCAFG blended film was superior to that of hb-PPS/BCAFG blended one. The photocrosslinking was mainly due to the acid-catalyzed polymerization of the epoxy moieties of BCAFG. PMPS and hb-PPS moieties were incorporated with the film by the termination reaction of the polymerization with the terminal OH groups.

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