Rapid Photopolymerization of Oligodeoxynucleotides by 3-Cyanovinylcarbazole mediated DNA Photocrosslinking

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  • Nakamura Shigetaka
    School of Materials Science, Japan Advanced Institute of Science and Technology
  • Fujimoto Kenzo
    School of Materials Science, Japan Advanced Institute of Science and Technology Research Center for Bio-Architecture, Japan Advanced Institute of Science and Technology

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We proposed rapid photopolymerization of oligodeoxynucleotides (ODNs) by 3-cyanovinylcarbazole (CNVK), which photoirradiates the crosslinking between DNA strands at 366 nm. This photopolymerization of ODNs using CNVK was completed by the photoirradiation for within two seconds, the reaction rate of which is faster than any other method such as enzymatic and chemical ligation. Moreover, the photopolymerized DNA structure was degraded to the monomer ODN by photoirradiation at 312 nm. The photopolymerized DNA structure has B-form the same as the native helical duplex structure and its structure attained thermal resistance when maintained at a temperature of 60°C. Sequence specific photopolymerization incorporating micro RNA was also successful.

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