Defect Precursor and Metal Reduction from DSAL Resist using Filtration and Ion Exchange
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- Umeda Toru
- SLS Global Technical Support, Nihon Pall Ltd.
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- Tsuzuki Shuichi
- SLS Global Technical Support, Nihon Pall Ltd.
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抄録
Gel particle is a primal defect in block copolymer (BCP) layer in directed self assembly lithography(DSAL). We studied gel removal performance for various lithography process filters and found that nylon 6,6 membrane outperformed other membrane materials exerting adsorption performance similarly to the conventional chemical amplified resist (CAR) filtration. Contrary to the CAR, BCP is synthesized using metal polymerization initiator and the metal in the resist layer should be removed to prevent potential impact to the device integrity failure or the yield loss. We also studied metal reduction from the BCP solution using ion exchange filter and particle removal filters. As a result, ion exchange filter effectively reduced metals from BCP solution as expected. In addition, unexpectedly, nylon 6,6 membrane best reduced some metal species in the BCP solution.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 27 (4), 441-444, 2014
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詳細情報 詳細情報について
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- CRID
- 1390001204325053312
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- NII論文ID
- 130004687607
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- NII書誌ID
- AA11576862
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 025604125
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可