Photochemical Reactions for Replicating and Aligning Block Copolymer Thin Film Patterns

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  • Janes Dustin W.
    McKetta Department of Chemical Engineering, The University of Texas at Austin
  • Inoue Takejiro
    Institute for Molecular Engineering, The University of Chicago Electronic and Imaging Material Research Laboratories, Toray Industries, Inc.
  • McCoy Bradley D.
    McKetta Department of Chemical Engineering, The University of Texas at Austin
  • Madan Ishita
    McKetta Department of Chemical Engineering, The University of Texas at Austin
  • Nealey Paul F.
    Institute for Molecular Engineering, The University of Chicago
  • Willson C. Grant
    McKetta Department of Chemical Engineering, The University of Texas at Austin Department of Chemistry, The University of Texas at Austin
  • Ellison Christopher J.
    McKetta Department of Chemical Engineering, The University of Texas at Austin

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A photochemical process for transfer printing patterns formed by block copolymer thin films is described here. An unpatterned, transparent substrate coated in liquid conformal layer is pressed to an epitaxially aligned block copolymer thin film. Irradiation through the sample stack by UV light drives a benzophenone-mediated grafting reaction which covalently bonds the top surface of the block copolymer film to the photopolymerized conformal layer. Separation of the sample stack recovers the original guiding pattern as well a new chemically patterned substrate replicated from the original pattern. Using a single lithographically directed chemical pattern, 10 replicas are generated, each possessing 28 nm periodicity, perpendicularly oriented microdomains, and long-range epitaxial alignment.

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