Evaluation of Template Releasing Energy in Nanoimprint Lithography
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- Nishino Tomoki
- Osaka Prefecture University, Department of Physics and Electronics Engineering, Graduate School of Engineering Japan Science and Technology Agency, CREST(Core Research of Evolutional Science & Technology)
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- Fujita Honoka
- Osaka Prefecture University, Department of Physics and Electronics Engineering, Graduate School of Engineering
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- Kawata Hiraoka
- Osaka Prefecture University, Department of Physics and Electronics Engineering, Graduate School of Engineering Japan Science and Technology Agency, CREST(Core Research of Evolutional Science & Technology)
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- Hirai Yoshihiko
- Osaka Prefecture University, Department of Physics and Electronics Engineering, Graduate School of Engineering Japan Science and Technology Agency, CREST(Core Research of Evolutional Science & Technology)
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抄録
To investigate template releasing process in nanoimprint lithography, template releasing energy from resist polymer is evaluated under various conditions using test rig. The template releasing energy is proportional to the surface energy of the template, however it does not depend on rigidness of the system and template lifting speed.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 26 (1), 137-141, 2013
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詳細情報 詳細情報について
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- CRID
- 1390001204325438080
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- NII論文ID
- 130004465006
- 40019685761
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BC3sXhtFalu7zK
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 024660605
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可