High Throughput Grating Qualification for Rating Directed Self-Assembly Pattern Performance using Optical Metrology
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- Gronheid Roel
- IMEC
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- Van Look Lieve
- IMEC
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- Delgadillo Paulina Rincon
- IMEC Katholieke Universiteit Leuven, Department of Electrical Engineering (ESAT) Institute for Molecular Engineering, University of Chicago
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- Pollentier Ivan
- IMEC
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- Gao Yi
- AZ Electronic Materials
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- Lin Guanyang
- AZ Electronic Materials
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- Nealey Paul F.
- Institute for Molecular Engineering, University of Chicago
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This paper describes a novel scatterometry-based optical inspection technique to quantify the degree of ordering of line/space gratings fabricated through a chemo-epitaxy directed self-assembly process. Process window analysis with this optical metrology is compared to analysis based on SEM and excellent agreement is demonstrated. However, other process parameters, including pattern CD, profile and especially pattern height influence the output signal. This requires normalization to a known good condition for correct data interpretation. The optical technique is useful for evaluating performance of closely related processes, and is thus ideally suited for bake optimizations, material selections, and monitoring purposes.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 26 (2), 147-152, 2013
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詳細情報 詳細情報について
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- CRID
- 1390001204325440512
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- NII論文ID
- 130004465011
- 40019685405
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BC3sXhtFalu73O
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 024660125
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可