Fabrication of Low Dislocation Density GaN Template by Nano-channel FIELO Using Nanoimprint Lithography
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- Okada Akiko
- Department of Nanoscience and Nanoengineering, Waseda University
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- Shoji Shuichi
- Department of Nanoscience and Nanoengineering, Waseda University
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- Shinohara Hidetoshi
- Nano Processing System Division, Toshiba Machine Co. Ltd
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- Goto Hiroshi
- Nano Processing System Division, Toshiba Machine Co. Ltd
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- Sunakawa Haruo
- Nitride Semiconductor Department, Furukawa Co. Ltd.
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- Matsueda Toshiharu
- Nitride Semiconductor Department, Furukawa Co. Ltd.
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- Usui Akira
- Nitride Semiconductor Department, Furukawa Co. Ltd.
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- Yamaguchi Atsushi A.
- Optoelectronic Device System R&D Center, Kanazawa Institute of Technology
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- Mizuno Jun
- Department of Nanoscience and Nanoengineering, Waseda University
この論文をさがす
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 26 (1), 69-72, 2013
フォトポリマー学会
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詳細情報 詳細情報について
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- CRID
- 1390001204325449600
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- NII論文ID
- 130004464993
- 40019685503
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BC3sXhtFalurfN
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 024660289
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles