Development of Photosensitive Alicyclic Polyimides Based on Reaction Development Patterning
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- Yasuda Megumi
- Department of Advanced Materials Chemistry, Faculty of Engineering, Yokohama National University
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- Takahashi Akio
- Department of Advanced Materials Chemistry, Faculty of Engineering, Yokohama National University
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- Oyama Toshiyuki
- Department of Advanced Materials Chemistry, Faculty of Engineering, Yokohama National University
Search this article
Journal
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 26 (3), 357-360, 2013
The Society of Photopolymer Science and Technology(SPST)
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Keywords
Details 詳細情報について
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- CRID
- 1390001204325501056
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- NII Article ID
- 130004721121
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- NII Book ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BC3sXhtFCmtL%2FF
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- ISSN
- 13496336
- 09149244
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- NDL BIB ID
- 024660703
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
