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Spin-on silicon-nitride Films for Photo-lithography by RT Cure of Polysilazane
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- Shinde Ninado
- PHPS R&D Division, STC, AZ Electronic Materials Japan KK
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- Takano Yusuke
- PHPS R&D Division, STC, AZ Electronic Materials Japan KK
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- Sagan John
- Global Applications, R&D Division, AZ Electronic Materials USA Corp
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- Monreal Victor
- Department of Applied Chemistry, Graduate School of Engineering, Saitama Institute of Technology,
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- Nagahara Tatsuro
- PHPS R&D Division, STC, AZ Electronic Materials Japan KK
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Description
Perhydropolysilazane (PHPS) is widely used as high cure temperature pre-ceramic polymer. In this paper, we report the conversion of PHPS films into solvent insoluble amorphous-silicon-nitride at room temperature in an inert atmosphere by vacuum ultra-violet (VUV) exposure. The films were deposited using spin-coating and pre-baked at 80°C for 3 mins before VUV exposure. The FT-IR spectra show an increase in Si-N bonds, a large reduction in Si-H content and complete elimination of N-H on VUV exposure. The refractive index (RI) ∼2.1 and extinction coefficient (k) ∼0.45 at 193nm were calculated using Cauchy fitting of spectroscopic ellipsometry (SE) measurements. The extinction coefficient exhibits a linearly dependence on VUV exposure time, suggestive VUV exposure time can be used a parameter to control the optical parameters of the films. These films could be used as inorganic-BARC (bottom anti-reflection coating) for ArF photolithography and the results are in accordance with the ProLith simulations showing that film of thickness ∼22nm corresponding to the 1st minima of the swing curve is sufficient for pattern generation.
Journal
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 23 (2), 225-230, 2010
The Society of Photopolymer Science and Technology(SPST)
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Keywords
Details 詳細情報について
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- CRID
- 1390001204325823360
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- NII Article ID
- 130004464796
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- NII Book ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BC3cXpsVOisbc%3D
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- ISSN
- 13496336
- 09149244
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- NDL BIB ID
- 10736717
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL Search
- Crossref
- CiNii Articles
- OpenAIRE
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- Abstract License Flag
- Disallowed