Preparation of Nanopatterned Polyimide by Imprinting and Curing Phenylethynyl- terminated Imide Oligomer
-
- Ogino Masahiko
- Hitachi Research Laboratory, Hitachi, Ltd.
-
- Ohashi Tatsuya
- Hitachi Research Laboratory, Hitachi, Ltd.
-
- Yoshida Hirofumi
- Hitachi Research Laboratory, Hitachi, Ltd.
-
- Nagayama Daigo
- Department of Biomolecular Functional Engineering, Ibaraki University
-
- Kubota Toshio
- Department of Biomolecular Functional Engineering, Ibaraki University
-
- Morikawa Atsushi
- Department of Biomolecular Functional Engineering, Ibaraki University
-
- Ono Katsumichi
- Department of Biomolecular Functional Engineering, Ibaraki University
Search this article
Abstract
Addition-type phenylethynyl-terminated imide oligomers were synthesized from 4,4’-diaminodiphenyl ether(ODA), 4-phenylethynylphthalic anhydride (PEPA) and 3,3’,4,4’-biphenyltetracarboxylic dianhydride (BPDA) or 4,4’-hexafluoroisopropylidene)- dianhydrid (6FDA), and preparation of nanopatterned polyimide was examined by imprinting the melted phenylethynyl-terminated imide oligomer and crosslinking the ethynyl groups. Crosslinked polyimide films were prepared by pressing the melted phenylethynyl-terminated imide oligomers and curing them under pressure at 370 °C afterward, and the properties of the polyimide films were studied for comparison. The crosslnked polyimide films had high glass transition temperature (Tg) above 320 °C, and showed excellent tensile strength more than 100 MPa. Nanopatterned polyimide was prepared by imprinting the melted imide oligomer with a metal mold and curing it under pressure at 370 °C afterward. ZEONOR(R) film could be imprinted using the imprinted and cured imide oligomer as sub-mold instead of the metal mold.
Journal
-
- Journal of Photopolymer Science and Technology
-
Journal of Photopolymer Science and Technology 27 (2), 155-160, 2014
The Society of Photopolymer Science and Technology(SPST)
- Tweet
Details 詳細情報について
-
- CRID
- 1390001204325846400
-
- NII Article ID
- 130004678331
- 40020133024
-
- NII Book ID
- AA11576862
-
- ISSN
- 13496336
- 09149244
-
- NDL BIB ID
- 025604144
-
- Text Lang
- en
-
- Data Source
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- Abstract License Flag
- Disallowed