Material Innovations for 193-nm Resists

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The development of alicyclic methacrylate-based polymers has provided many opportunities for the design of new dry and immersion 193-nm resists, and their high etching resistance and transparent properties are appealing to resist chemists. The discovery of adamantanes marked a critical turning point, and the development of poly (2-methyl-2-adamantyl methacrylate-co-mevalonic lactone methacrylate)-based 193-nm resist enabled establishment of practical non-aromatic resist materials. This paper reviews our research and development.

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