Control of Photo and Thermal Decomposition of Diazo/PVA and Diazo/PVAc Resist with Inclusion Compounds
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- Harada Kieko
- Faculty of Engineering, Chiba University
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- Kushida Masahito
- Faculty of Engineering, Chiba University
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- Miyakawa Shinichi
- Faculty of Engineering, Chiba University
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- Takahara Shigeru
- Faculty of Engineering, Chiba University
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- Sugita Kazuyuki
- Faculty of Engineering, Chiba University
Bibliographic Information
- Other Title
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- Control Photo and Thermal Decomposition of Diazo/PVA and Diazo/PVAc Resist with Inclusion Compounds
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Abstract
Photo and thermal decompositions of a diphenylamine-4-diazonium sulfate/formaldehyde condensate (DSR) / polyvinyl alcohol (PVA) resist containing a little polyvinyl acetate (PVAc) units :DSR/PVA emulsion film: were supressed by forming a complex with 18-crown-6 (18C6) at the diazo group, while both decompositions of the DSR/PVA emulsion film with polyethylene glycol 300 (PEG) which includes the benzene ring of the diazo compound was accelerated. Photo decomposition rate of the DSR/PVA resist with β-cyclodextrin (CD) which includes also the benzene ring of the diazo compound did not change, but thermal decomposition was suppressed. The DSR-PVA emulsion film showed blue color. The coloring of the DSR-PVA emulsion films was suppressed by inclusion of 18C6 or PEG.
Journal
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 18 (2), 187-192, 2005
The Society of Photopolymer Science and Technology(SPST)
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Details 詳細情報について
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- CRID
- 1390001204326237824
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- NII Article ID
- 130004833000
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- NII Book ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD2MXmtV2rt7s%3D
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- ISSN
- 13496336
- 09149244
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- NDL BIB ID
- 7338364
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed