XRF analysis of magnetic thin film conducted by a fundamental parameter method.

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  • ファンダメンタルパラメーター法による磁性薄膜の蛍光Ｘ線分析
  • ファンダメンタル パラメーターホウ ニ ヨル ジセイ ハクマク ノ ケイコウ

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Abstract

XRF analysis carried out by the fundamental parameter (FP) method was made to determine the composition and film thickness of thin film of Co-Cr and Tb-Fe-Co systems. For many standard samples, composition and thickness are known, and complicated pretreatment has been required for multicomponent thin film analysis conducted by a conventional calibration curve method. Analysis of thin film in a shorter period, for which for less amounts of standard samples are required, is possible by the FP method. The accuracy became six times as much by preparing a calibration curve based only on several standard thin film samples in making analysis using only the FP method. This method showed good repeatability, and relative standard deviations of each composition and thickness were less than 0.5%.

Journal

  • BUNSEKI KAGAKU

    BUNSEKI KAGAKU 38 (10), T160-T163, 1989

    The Japan Society for Analytical Chemistry

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