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- SUZUKI Naofumi
- Nano-Electronics Res. Labs., NEC Corporation
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- ANAN Takayoshi
- Nano-Electronics Res. Labs., NEC Corporation
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- HATAKEYAMA Hiroshi
- Nano-Electronics Res. Labs., NEC Corporation
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- FUKATSU Kimiyoshi
- Nano-Electronics Res. Labs., NEC Corporation
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- YASHIKI Kenichiro
- Nano-Electronics Res. Labs., NEC Corporation
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- TOKUTOME Keiichi
- Nano-Electronics Res. Labs., NEC Corporation
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- AKAGAWA Takeshi
- Nano-Electronics Res. Labs., NEC Corporation
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- TSUJI Masayoshi
- Nano-Electronics Res. Labs., NEC Corporation
書誌事項
- 公開日
- 2009
- DOI
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- 10.1587/transele.e92.c.942
- 公開者
- 一般社団法人 電子情報通信学会
この論文をさがす
説明
We have developed InGaAs-based VCSELs operating around 1.1µm for high-speed optical interconnections. By applying GaAsP barrier layers, temperature characteristics were considerably improved compared to GaAs barrier layers. As a result, 25Gbps 100°C error-free operation was achieved. These devices also exhibited high reliability. No degradation was observed over 3, 000 hours under operation temperature of 150°C and current density of 19kA/cm2. We also developed VCSELs with tunnel junctions for higher speed operation. High modulation bandwidth of 24GHz and a relaxation oscillation frequency of 27GHz were achieved. 40Gbps error-free operation was also demonstrated.
収録刊行物
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- IEICE Transactions on Electronics
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IEICE Transactions on Electronics E92-C (7), 942-950, 2009
一般社団法人 電子情報通信学会
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キーワード
詳細情報 詳細情報について
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- CRID
- 1390001204374704512
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- NII論文ID
- 10026822662
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- NII書誌ID
- AA10826283
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- ISSN
- 17451353
- 09168524
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可