Characterization of Impurities in Synthetic Diamonds by Using Synchrotron Radiation X-ray Fluorescence Analysis.
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- Hayakawa Shinjiro
- Department of Applied Chemistry, The University of Tokyo
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- Jia Xiao-Peng
- Institute of Materials Science, Univ. of Tsukuba
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- Gohshi Yohichi
- Department of Applied Chemistry, The University of Tokyo
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- Wakatsuki Masao
- Institute of Materials Science, Univ. of Tsukuba
Bibliographic Information
- Other Title
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- ダイヤモンドの高圧合成 放射光蛍光Ｘ線分析を用いる合成ダイヤモンドの不純物解析
- ホウシャコウ ケイコウ Xセン ブンセキ オ モチイル ゴウセイ ダイヤモンド
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Abstract
Trace impurities in synthetic diamonds are characterized by using a scanning x-ray microprobe with synchrotron radiation. The diamond crystals analyzed were grown under high pressure and high temperature with the various metalic solvents. Utilizing synchrotron radiation (SR) x-ray fluorescence (XRF) analysis, concentrations of trace impurities down to 0. 1 ppm can be evaluated. Moreover, the x-ray energy dependence of XRF yield around the absorption edge shows the near-edge x-ray absorption fine structure of the trace impurities, which provides chemical-state information on the trace impurities in the diamond crystal. The future expectation of analytical capability with the next generation synchrotron light source is also described.
Journal
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- The Review of High Pressure Science and Technology
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The Review of High Pressure Science and Technology 8 (3), 147-154, 1998
The Japan Society of High Pressure Science and Technology
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Details 詳細情報について
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- CRID
- 1390001204380885632
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- NII Article ID
- 10002849201
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- NII Book ID
- AN10452913
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- ISSN
- 13481940
- 0917639X
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- NDL BIB ID
- 4546290
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed