Fine Control of Pore-opening Size of Zeolite by Chemical Vapor Deposition Method

DOI Web Site
  • NIWA Miki
    Department of Synthetic Chemistry, Faculty of Engineering, Nagoya University
  • MURAKAMI Yuichi
    Department of Synthetic Chemistry, Faculty of Engineering, Nagoya University

Bibliographic Information

Other Title
  • 化学蒸着法によるゼオライト細孔入ロ径の精密制御
  • Special articles on zeolite chemistry and technology. Fine control of pore-opening size of zeolite by chemical vapor deposition method.

Abstract

Progress on chemical vapor deposition (CVD) method aiming at finely controlling of poreopening size of zeolites by deposition of silicon alkoxide was summarized. Shape-selectivity observed on the CVD zeolite was explained, exemplified by cracking of paraffin isomers on mordenite and methanol conversion on ZSM-5. Characterization of this novel material was shown on the basis of sorption experiment and spectroscopic studies such as XPS and EXAFS. Deposition mechanism was then identified from evolved products and behavior of the accumulation of silica. Finally, following important findings were concluded: ( 1 ) Shape-selectivity in an accuracy of 0.01nm; ( 2 ) Function of ultrathin silica layer; ( 3 ) Epitaxial growth of silica on the external surface of zeolite.

Journal

  • NIPPON KAGAKU KAISHI

    NIPPON KAGAKU KAISHI 1989 (3), 410-419, 1989-03-10

    The Chemical Society of Japan

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