Transition Edge X-ray Sensor Using Anodic Bonding Wafer
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- Tanaka Keiichi
- Seiko Instruments Inc.
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- Morooka Toshimitsu
- Seiko Instruments Inc.
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- Nakayama Satoshi
- Seiko Instruments Inc.
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- Chinone Kazuo
- Seiko Instruments Inc.
Bibliographic Information
- Other Title
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- 陽極接合ウエハーを用いたTransition Edge X-ray Sensor
- 解説 陽極接合ウエハーを用いたTransition Edge X-ray Sensor
- カイセツ ヨウキョク セツゴウ ウエハー オ モチイタ Transition Edge X ray Sensor
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Description
We describe the fabrication of Transition Edge X-ray Sensor(TES) using anodic bonding wafer that is suitable for large format array that is necessary for industrial application and astronomy. We also report the performance of TES for single pixel. The characteristic points of our fabrication are 1) use of silicon-to-glass bonding(anodic bonding) wafer, yielding the large mechanical strength of the wafer, 2) only front side patterning and etching, yielding the easy fabrication. The energy resolution of TES operated at 113 mK was 9.2 eV(FWHM) for Mn K<1(5899 eV) and effective decay time(τeff) 71 μs. The energy resolution is 10 times better than conventional silicon-detector(130eV) and the count rate(1/6τeff) reached about 2.4 kcps.
Journal
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- IEEJ Transactions on Sensors and Micromachines
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IEEJ Transactions on Sensors and Micromachines 122 (11), 517-522, 2002
The Institute of Electrical Engineers of Japan
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Details 詳細情報について
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- CRID
- 1390001204461460096
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- NII Article ID
- 10010455183
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- NII Book ID
- AN1052634X
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- ISSN
- 13475525
- 13418939
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- NDL BIB ID
- 6345313
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed