The Growth Mechanism of Al-doped ZnO using Oxygen Controlled Seed Layer in Si based Thin Film Solar Cells
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- Joo Minho
- Devices and Materials Laboratory, LG Electronics Advanced Research Institute
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- Shin Huiyoun
- Devices and Materials Laboratory, LG Electronics Advanced Research Institute
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- Lee Jangho
- Devices and Materials Laboratory, LG Electronics Advanced Research Institute
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- Moon Seungkyu
- Devices and Materials Laboratory, LG Electronics Advanced Research Institute
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- Moon Taeho
- Devices and Materials Laboratory, LG Electronics Advanced Research Institute
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- Park Kyuho
- Devices and Materials Laboratory, LG Electronics Advanced Research Institute
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Abstract
We studied the growth mechanism of Al-doped ZnO (AZO) films using seed layers for enhancing the performance of transparent conducting oxides (TCOs) in the thin film solar cells. We carried out two-step processes for the deposition of AZO films. Seed layers were deposited on glass substrate as a function of Ar/O2 gas flow ratio. We show the results of our investigation on the micro-structural properties of AZO seed layers using transmission electron microscopy (TEM). The elemental composition and electronic structure changes with the deposition conditions were examined using energy dispersive X-ray (EDX) and reflective electron energy loss spectroscopy (REELS). The optical and electrical characteristics of AZO film using the seed layer with Ar/O2 = 9/1 show a high haze value of 88% at 500 nm and a resistivity value of 3.7 × 10-4 Ωcm.
Journal
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- Journal of Surface Analysis
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Journal of Surface Analysis 17 (3), 274-277, 2011
The Surface Analysis Society of Japan
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Details 詳細情報について
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- CRID
- 1390001204471329408
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- NII Article ID
- 130005138955
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- NII Book ID
- AA11448771
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- ISSN
- 13478400
- 13411756
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- NDL BIB ID
- 11077615
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed