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Influence of the Concentration of the Chlorine Ion in the Polybenzoxazole Precursors on the Corrosion of Metals
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- IKEDA Osamu
- Sony Corporation, Micro Systems Network Company, Core Technology Development Group, Corrosion Analysis Center
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- ITOH Fuminari
- Sony Corporation, Micro Systems Network Company, Core Technology Development Group, Corrosion Analysis Center
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- HASEGAWA Masatoshi
- Department of Chemistry, Faculty of Science, Toho University
Bibliographic Information
- Other Title
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- ポリベンゾオキサゾール前駆体中の塩素イオン濃度のコロージョンへの影響
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Description
Polybenzoxazoles (PBO) precursors consisting of bis (3-hydroxy-4-amino) biphenyl (p-HAB), 2, 2'-bis (3-amino-4-hydroxyphenyl) hexafluoropropane (AH6FP), and terephthaloyl choloride (TPC) showed high solubility in common organic solvents. PBO precursors were polymerized from silylated p-HAB (50mol-%), AH6FP (50mol-%), and TPC (100mol-%), in NMP containing LiCl (about 1 wt-%) . The PBO precursor was precipitated in a large excess of water to remove some ionic impurities and to refine it. The concentration of the chlorine ion in the PBO precursors analyzed by ion chromatography was about 500 ppm, after the precipitate was repeatedly washed with fresh water. The corrosion of copper or silver metals was significantly suppressed.
Journal
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- Journal of The Japan Institute of Electronics Packaging
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Journal of The Japan Institute of Electronics Packaging 8 (7), 561-566, 2005
The Japan Institute of Electronics Packaging
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Keywords
Details 詳細情報について
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- CRID
- 1390001204560076032
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- NII Article ID
- 130004166222
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- ISSN
- 1884121X
- 13439677
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- Text Lang
- ja
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- Data Source
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- JaLC
- Crossref
- CiNii Articles
- OpenAIRE
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- Abstract License Flag
- Disallowed