Measurement of Local Two Dimensional Stress Distribution in a Flip Chip Structure by Using Strain Sensor Chips with 2-.MU.m Long Piezoresistance Gauges

  • Sasaki Takuya
    Department of Nanomechanics, Graduate School of Engineering, Tohoku University
  • Ueta Nobuki
    Department of Nanomechanics, Graduate School of Engineering, Tohoku University
  • Miura Hideo
    Fracture and Reliability Research Institute, Tohoku University

Bibliographic Information

Other Title
  • ピエゾ抵抗ひずみセンサを用いたフリップチップ実装構造内局所2軸残留応力分布の測定
  • ピエゾ テイコウヒズミ センサ オ モチイタ フリップチップ ジッソウ コウゾウ ナイキョクショ 2ジク ザンリュウ オウリョク ブンプ ノ ソクテイ

Search this article

Abstract

Complicated local distribution of residual stress and strain occurs in flip-chip structures due to the difference in material properties such as the coefficients of thermal expansion and elastic modulus among metallic bumps, underfill material, the silicon chip and the substrate. The residual stress was measured using newly-developed strain sensor chips with 2-μm long piezoresistance gauges. As a result of three dimensional analyses and the experiment, it was found that the amplitude of the residual stress in the stacked chips reached about 300 MPa. In addition, both isotropic and anisotropic normal stress fields appeared locally on the chip surface depending on the bump alignment. The magnitude of the difference in the anisotropic residual normal stress reached 150 MPa.

Journal

Citations (2)*help

See more

References(27)*help

See more

Related Projects

See more

Details 詳細情報について

Report a problem

Back to top