Chemical Wet Etching Process Technology for Fabricating SrTiO3 Thin Film Capacitors on Core Resin Films

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  • Yamada Hiroji
    Central Research Laboratory, Hitachi, Ltd.
  • Okabe Hiroshi
    Central Research Laboratory, Hitachi, Ltd.
  • Yamashita Kiichi
    Central Research Laboratory, Hitachi, Ltd. Department of Electrical and Electronics Engineering, Kagoshima University

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  • 化学的ウエットエッチングによる樹脂フィルム上へのＳｒＴｉＯ３薄膜容量形成プロセス技術
  • カガクテキ ウエットエッチング ニ ヨル ジュシ フィルム ジョウ エ ノ SrTiO3 ハクマク ヨウリョウ ケイセイ プロセス ギジュツ

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Description

The core resin film, electrode configuration and processing technology of a SrTiO3 (STO) thin-film capacitor, which is expected to be suitable for fabrication at reduced costs, were examined. The high-frequency characteristics of the capacitor fabricated using this processing technology were also investigated. The following results were obtained. (1) Fabrication of an STO thin-film capacitor on a polyimide or glass-epoxy film is possible. (2) A Ru/STO/Cr–Cu three-layer-film configuration is highly promising. (3) Batch processing of the pattern formation of the 300-nm-thick STO thin-film capacitor by all chemical-etching techniques is possible. In addition, it was confirmed that the STO thin-film capacitor has a flat-frequency response up to 10 GHz, a relative dielectric constant of 17 and a capacitor density of 500 pF/mm2.

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