Initial Deposition Process of Polypyrrole on the Positively Charged Substrates by In Situ Polymerization Method

DOI Web Site Web Site 18 References

Bibliographic Information

Other Title
  • ｉｎ　ｓｉｔｕ　重合法による正に荷電した基板上へのポリピロール初期堆積過程
  • in situ ジュウゴウホウ ニ ヨル セイ ニ カデン シタ キバン ジョウ エ ノ ポリピロール ショキ タイセキ カテイ

Search this article

Abstract

The surface treatment of glass substrates affects the in situ polymerization of pyrrole on them. Here, we have studied the initial deposition process for the positively charged substrates. It was found that no notable difference is induced by dipping the substrates in solutions containing one or two components of the in situ polymerization solution, prior to in situ polymerization. However, dipping in the in situ polymerization solution containing all three components, pyrrole, FeCl3 and p-toluenesolfonic acid sodium salt (PTSNa) removed the rest time. This fact implies that the polymerization reaction of pyrrole on the substrate is required to initiate the deposition of polypyrrole. It was also observed that photoelectron emission from the substrates for which the polymerization was quenched during the rest time, indicating the depositon of oligomerized or polymerized pyrrole on the substrates although the deposition could not be detected by the optical absorption spectra.

Journal

References(18)*help

See more

Keywords

Details 詳細情報について

Report a problem

Back to top