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Properties of PD Degradation/Breakdown in a Micro Gap with an Artificial Void Model
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- Imai Kuniharu
- Department of Radiological Technology, Nagoya University
Bibliographic Information
- Other Title
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- 模擬ボイドモデルを用いた微小空隙内のＰＤ劣化・破壊特性
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Description
In this study, an artificial void model was made on the basis of the Whitehead abc model and time to breakdown of a PP film which formed the artificial void was investigated with the Weibull distribution. Voltage dependence of time to breakdown of the PP film (V-t characteristic) becomes discontinuous at a certain voltage between 12 and 13kV. Furthermore, repetition of the breakdown mechanism transition (fatigue-failure- type→ random-failure-type or early/random-failure- type) occurs at the certain voltage. These results suggest that patterns of surface discharge in the artificial void change from Polbüschel to Gleitbüschel.
Journal
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- IEEJ Transactions on Fundamentals and Materials
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IEEJ Transactions on Fundamentals and Materials 123 (8), 819-820, 2003
The Institute of Electrical Engineers of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390001204594739072
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- NII Article ID
- 10011450009
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- NII Book ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- Text Lang
- ja
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- Data Source
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- JaLC
- Crossref
- CiNii Articles
- OpenAIRE
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- Abstract License Flag
- Disallowed