Active Oxygen Generator by Silent Discharge and Oxidation Power in Formation of Oxide Thin Films

DOI Web Site Web Site 13 References

Bibliographic Information

Other Title
  • 無声放電式活性酸素発生機と酸化薄膜形成に於ける酸化力
  • ムセイ ホウデンシキ カッセイ サンソ ハッセイキ ト サンカ ハクマク ケイセイ ニ オケル サンカリョク

Search this article

Abstract

We have studied the low pressure silent discharge type active oxygen generator in terms of the application to the formation of oxide thin films. In this paper the oxidation power of active oxygen in the oxide thin film formation is compared with that of oxygen and ozone by forming silicon oxide thin films. It was confirmed that the oxidation power is in turn of active oxygen > ozone > oxygen from the experimental result of the number of x in SiOx thin film. Furthermore we applied active oxygen to the formation of the thin film high temperature super conductor and active oxygen was found to be effective to the formation of the thin film with high performance.

Journal

References(13)*help

See more

Keywords

Details 詳細情報について

Report a problem

Back to top