Effects of Barrier on Creeping Discharge Characteristics in SF<sub>6</sub> and N<sub>2</sub> Gases under Pulse Voltages
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- Watabe Katunori
- Himeji Insutitute of Technology
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- Kamatani Humihiro
- Himeji Insutitute of Technology
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- Kobayashi Nobumasa
- Himeji Insutitute of Technology
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- Onoda Mitsuyoshi
- Himeji Insutitute of Technology
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- Nakayama Hiroshi
- Himeji Insutitute of Technology
Bibliographic Information
- Other Title
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- SF<sub>6</sub>およびN<sub>2</sub>ガス中のパルス電圧による沿面放電特性に及ぼすバリアの効果
- SF6およびN2ガス中のパルス電圧による沿面放電特性に及ぼすバリアの効果
- SF6 オヨビ N2 ガスチュウ ノ パルス デンアツ ニヨル エンメン ホウ
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Description
This paper describes the effect of barrier upon creeping discharge characteristics in SF6, N2 and their mixture. The barrier height effect on the discharge voltage was investigated under the positive pulse voltage. The discharge voltage increased as increasing the barrier height in SF6 gas. On the other hand, the discharge voltage hardly changed with the barrier height in N2 gas. In order to make clear the mechanism of the initial creeping corona, it was observed with the optical technique such as ultra-high speed electronic imaging system(IMACON 468).<br>As the result, creeping corona path revealed the difference in images under various barrier height. And the charge accumulated on the barrier induced with the initial corona in SF6 gas could suppress the development of the later creeping corona in contrast with N2 gas.
Journal
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- IEEJ Transactions on Fundamentals and Materials
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IEEJ Transactions on Fundamentals and Materials 117 (11), 1090-1096, 1997
The Institute of Electrical Engineers of Japan
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Details 詳細情報について
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- CRID
- 1390001204599613696
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- NII Article ID
- 10010454261
- 130006839374
- 10002823027
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- NII Book ID
- AN10136312
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- ISSN
- 13475533
- 03854205
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- NDL BIB ID
- 4323887
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed