Improvement of the Etching Fuse Performance by Elements Pattern Design

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  • エレメントパターンの改良によるエッチングヒューズの特性改善
  • エレメント パターン ノ カイリョウ ニ ヨル エッチング ヒューズ ノ トクセイ カイゼン

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Abstract

An etching fuse is used for semiconductor protection, and is expected to have higher current breaking performance in smaller size. This paper describes test results of etching fuses having three kinds of element patterns to improve current breaking performance. The first kind concerned the additional plating on the current conducting (heat radiation) part of the element, while the thickness of plating at current breaking part remained as it was. Test results showed that this pattern made the element resistance lower compared with no additional plating element, and thus the improvement of current rating up to approximately 30% could be achieved. The second kind concerned the increase in the number of parallel current breaking points (P) of fuse element. Experiments revealed that the cut-off currents and the I2t values decreased with the number of P. The third concerned the prolongation of breaking part and the increase of the number of series breaking points (S). Test results exhibited that the increase of S was slightly effective in current breaking performance rather than the extension of breaking part. Current breaking characteristics of these element patterns are useful in improving the etching fuse performance for semiconductor protection use.

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