書誌事項
- タイトル別名
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- Improvement of <i>J</i><sub>C</sub> Properties through Control of Nanorod Morphology
- ナノロッド形態制御による臨界電流特性の向上 : 成長条件の制御による高密度ナノロッドの形成
- ナノロッド ケイタイ セイギョ ニ ヨル リンカイ デンリュウ トクセイ ノ コウジョウ : セイチョウ ジョウケン ノ セイギョ ニ ヨル コウミツド ナノロッド ノ ケイセイ
- Improvement of JC Properties through Control of Nanorod Morphology
- —Formation of High-density Nanorods by Controlling Growth Conditions—
- ―成長条件の制御による高密度ナノロッドの形成―
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BaHfO3 nanorod doped SmBa2Cu3Oy films were deposited on LaAlO3 (001) substrates using pulsed-laser deposition (PLD). An alternating target (ALT) technique was used as the BaHfO3 supply method. Two films were grown at 910 and 830ºC using a conventional PLD technique. One film was grown at 750ºC (an upper layer) on a seed layer using a low temperature growth (LTG) technique. Nanorod morphologies were analyzed using a scanning transmission electron microscopy (STEM) with an energy dispersive X-ray spectroscopy. It was found that the nanorod morphology varied by changing the growth temperature and the underlying structure. It was found that the critical current properties qualitatively corresponded to the nanorod morphology. In the case of straight, continuous nanorods, a magnetic field for the maximum value of global pinning force and the matching field estimated by a plan-view STEM analysis were consistent. We discussed the parameters for the control of nanorod morphology including the growth temperature and the underlying structure which were confirmed as the parameters in this experiment.
収録刊行物
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- 低温工学
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低温工学 48 (9), 485-492, 2013
公益社団法人 低温工学・超電導学会 (旧 社団法人 低温工学協会)
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詳細情報 詳細情報について
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- CRID
- 1390001204614627328
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- NII論文ID
- 10031196979
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- NII書誌ID
- AN00333419
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- COI
- 1:CAS:528:DC%2BC3sXhvVaksLzL
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- ISSN
- 18800408
- 03892441
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- NDL書誌ID
- 024926192
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- 抄録ライセンスフラグ
- 使用不可