金蒸着膜の内部応力および構造のX線による研究 (II)

金原 粲

doi:10.11470/oubutsu1932.30.647

Effect of annealing on the properties of thin gold films deposited in vacuo has been studied by X-ray diffraction method with a Norelco X-ray spectrometer. Within a temperature range of 20_??_400°C, all physical properties are found to vary smoothly and monotonously by annealing. No special temperature corresponding to recrystallization temperature in bulk gold is found. As the annealing temperature is raised, the internal stress of film calculated from the strain in crystallites in the film decreases, the diffraction intensity increases, and the line breadth is reduced. From these results and those obtained in the preceding papers, the following conclusions are derived for the structure of “thin gold films deposited in vacuo (10^-5 mmHg) on glass substrates at room temperatures”, and for the origin of the internal stress in such films. 1. The film consists of two parts, crystalline and amorphous. The mean size of crystallites is 100_??_500Å, and in most crystallites, (111) planes are parallel to the substrate. When the film is very thin, the film is of the so-called “island” structure. 2. Very small crystallites are supposed to be in liquid state. 3. The structure of the film is influenced by residual gases present in the evaporation chamber. 4. If the film is below 1000Å in thickness, the thinner the film, the smaller the mean crystallite size is. 5. The mean crystallite size reaches its maximum at a film thickness of about 1000Å. In this region, the rate of crystal growth due to annealing is minimum. Such a film shall be named the “fundamental layer”.

金蒸着膜の内部応力および構造のX線による研究 (II)

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収録刊行物

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金蒸着膜の内部応力および構造のX線による研究 (II)

書誌事項

この論文をさがす

説明

収録刊行物

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書き出し

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詳細情報詳細情報について