Soft X-Ray Optics. Recent Progress in Soft X-Ray Multilayer Mirrors through Atomic Layer Deposition/Epitaxy Methods.

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  • KUMAGAI Hiroshi
    Laser Technology Laboratory, The Institute of Physical and Chemical Research (RIKEN)

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  • 軟Ｘ線オプティックス　原子層堆積／成長法による軟Ｘ線多層膜ミラーの新展開
  • ゲンシソウ タイセキ セイチョウホウ ニヨル ナンXセン タソウ マク ミラー

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Description

A new approach to the fabrication of multilayer mirrors on an atomic scale at soft x-ray wavelengths is desired to overcome serious problems regarding scattering loss at the rough surface and interface of the multilayer. In this review, recent progress regarding novel approaches utilizing atomic layer deposition and atomic layer epitaxy to the fabrication of multilayer structures for soft x-ray wavelengths is detailed. These novel approaches are expected to solve the above-mentioned problems and take the place of conventional sputtering methods because of their control performance of the surface on an atomic scale through their self-limiting functions.

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