Large-size High Temperature Superconducting Thin Film by High Power ArF Excime Laser.
-
- NAGAISHI Tatsuoki
- Itami Research Laboratories, Sumitomo Electric Industries, Ltd.
-
- ITOZAKI Hideo
- Itami Research Laboratories, Sumitomo Electric Industries, Ltd.
-
- ITAKURA Yasuo
- Advanced Research Laboratory, Research Division, Komatsu Ltd.
-
- NODOMI Ryoichi
- Advanced Research Laboratory, Research Division, Komatsu Ltd.
-
- YAGI Takashi
- Laser Laboratory, Institute of Research and Innovation
Bibliographic Information
- Other Title
-
- 大出力ArFエキシマレーザーを用いた酸化物高温超電導薄膜の大型化
- ダイシュツリョク ArF エキシマ レーザー オ モチイタ サンカブツ コウオ
Search this article
Description
40mm by 40mm large size YBa2Cu3O7-x high temperature superconducting thin films were fabricated by a pulsed laser deposition. A high energy ArF excimer laser up to 1.2J/pulse and a substrate-rotation deposition technique with substrate off setting to the center of the plume were developed for making large area thin films.The ArF excimer laser has a newly developed back UV-preionization system and a high precision high voltage trigger cirouit and utilizes a LC inversion voltage doubling circuit for high voltage discharge. To improve an energy profile of ArF laser beam, a segment mirror was also developed. Large area superconducting thin films were deposited with the shaped high energy ArF excimer laser of 0.58J on the surface of the target and the substrate rotation technique with off setting distance of40mm. The superconducting thin film has thickness variation less than10% and superconducting transition temperatures between 85K to 90K over the whole substrate.
Journal
-
- The Review of Laser Engineering
-
The Review of Laser Engineering 22 (11), 926-934, 1994
The Laser Society of Japan
- Tweet
Keywords
Details 詳細情報について
-
- CRID
- 1390001204646504704
-
- NII Article ID
- 130003701941
- 40004209769
-
- NII Book ID
- AN00255326
-
- ISSN
- 13496603
- 03870200
-
- NDL BIB ID
- 3905018
-
- Text Lang
- ja
-
- Data Source
-
- JaLC
- NDL Search
- Crossref
- CiNii Articles
- OpenAIRE
-
- Abstract License Flag
- Disallowed