選択成長マイクロファセットを用いたGaN系面発光型レーザー

書誌事項

タイトル別名
  • GaN-Based Surface-Emitting Lasers Using Micro-Facets Fabricated by Selective-Area Epitaxy
  • センタク セイチョウ マイクロ ファセット オ モチイタ GaNケイ メンハッコウガタ レーザー

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抄録

GaN microfacets have been grown by selective-area metalorganic vapor phase epitaxy (SA-MOVPE) and applied to GaN-based surface-emitting lasers. The crystal orientation of the microfacets was strictly controlled by the shapes of the mask-openings and growth conditions so that vertical and inclined microfacets were obtained. Hexagonal microprisms (HMPs) of GaN with 5-50μm in diameters have extremely smooth vertical side walls of GaN {10 1 0} microfacets. These GaN HMPs lase by optical pumping and have the inscribed hexagonal optical paths. Additionally, GaN-based horizontal cavity surface-emitting lasers (HCSELs) were successfully fabricated. The GaN-based HCSELs have Fabry-Perot cavity and outer micromirrors, which consist of SA-MOVPE grown {11 2 0} vertical and {11 2 2} inclined microfacets, and lased at room temperature by pulsed current injection. The laser beam emitted laterally from a Fabry-Perot cavity {11 2 0} vertical micromirror is reflected by a {11 2 2} inclined outer micromirror so as to be directed upward. The GaN-based HCSEL has a current-confining structure because the incorporation probability of p-type dopants (Mg) is strongly influenced by facet orientation (growth direction).

収録刊行物

  • レーザー研究

    レーザー研究 35 (2), 79-85, 2007

    一般社団法人 レーザー学会

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