Surface Contamination of Titanium by Abrading Treatment

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  • MIYAKAWA Osamu
    Department of Dental Materials and Technology, Niigata University School of Dentistry
  • WATANABE Kouichi
    Department of Dental Materials and Technology, Niigata University School of Dentistry
  • OKAWA Seigo
    Department of Dental Materials and Technology, Niigata University School of Dentistry
  • KANATANI Mitsugu
    Department of Dental Materials and Technology, Niigata University School of Dentistry
  • NAKANO Syuji
    Department of Dental Materials and Technology, Niigata University School of Dentistry
  • KOBAYASHI Masayoshi
    EMX Laboratory, Niigata University

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Other Title
  • チタン研磨面の汚染

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Abstract

This study investigated the contamination of abraded Ti surfaces. Using a polishing machine, specimens were abraded with waterproof SiC grit papers under water cooling. The abraded surfaces were examined using element analysis, X-ray diffraction, and hardness tests. Contaminant deposits with dimensions reaching about 30μm were observed throughout the surface. In these deposits, Ti was apparently reduced by about 10% and replaced by Si and O. The chemical bond state of the Si was similar to that of SiC or a titanium silicide. The O was solute in Ti, which increased the surface hardness. The contaminant deposits were amorphous or very thin. The contamination of Ti, the extent of which was related to hardness, resulted from a reaction with abrasives.

Journal

  • Dental Materials Journal

    Dental Materials Journal 15 (1), 11-21,71, 1996

    The Japanese Society for Dental Materials and Devices

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