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Magnetic field distribution of shadow mask and its influence on electron trajectory.
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- Nasuno H.
- Miyagi Polytechnic College
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- Haga A.
- Faculty of Engng., Tohoku Gakuin Univ.
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- Chiba T.
- Faculty of Engng., Tohoku Gakuin Univ.
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- Nakanishi H.
- Mitsubishi Electric Corp., Kyoto Works
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- Fujimura T.
- Mitsubishi Electric Corp., Kyoto Works
Bibliographic Information
- Other Title
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- シャドウマスクの磁界分布と電子軌道への影響
Description
It is well known that, in a color CRT, color change occurs due to the magnetization of a shadow mask and frame under the environmental magnetic field. In order to clarify the influence of the magnetization of a shadow mask and frame quantitatively, we measured the magnetic field distribution around the mask and frame, and calculated the electron beam trajectory change with a slit model to simulate a shadow mask. The results show that the remarkable change of the trajectory and velocity of electron beam occur in the slit region with the high magnetic flux density.
Journal
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- Journal of the Magnetics Society of Japan
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Journal of the Magnetics Society of Japan 14 (2), 403-406, 1990
The Magnetics Society of Japan ( Nihon Jiki Gakkai )
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Details 詳細情報について
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- CRID
- 1390001205089924480
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- NII Article ID
- 130004477777
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- COI
- 1:CAS:528:DyaK3MXhtlCjt7Y%3D
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- ISSN
- 18804004
- 02850192
- 08824959
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- Text Lang
- ja
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- Data Source
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- JaLC
- Crossref
- CiNii Articles
- OpenAIRE
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- Abstract License Flag
- Disallowed