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- 三友 護
- 科学技術庁無機材質研究所
書誌事項
- タイトル別名
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- Thermal Etch Patterns on SiC Crystals
- SiC ケッショウ ノ ネツ エッチング モヨウ
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説明
Surface features observed on the basal pinacoids of SiC crystals which are infered to thermal etching are described. These include concentric depressions, wave-shaped hills, depression spirals and others.<br>Both growth and etch features are observed on the same face, suggesting that growth and dissolution take place simultaneously on the same face and crystal.<br>Distinct differences in the characteristics of these features are noted between the (00.1) and (00.1) faces. It is also observed that the characteristics of thermal etch patterns vary progressively with the increase of undersaturation.<br>To trace the process of thermal etching, crystals are thermally etched and their surface features are compared with their original features as well as with that of as-grown crystals.
収録刊行物
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- 窯業協會誌
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窯業協會誌 78 (900), 264-267, 1970
公益社団法人 日本セラミックス協会
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詳細情報 詳細情報について
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- CRID
- 1390001205247805440
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- NII論文ID
- 110002305917
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- NII書誌ID
- AN00245650
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- ISSN
- 18842127
- 00090255
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- NDL書誌ID
- 8468337
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
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- 抄録ライセンスフラグ
- 使用不可