SIMOX法で作製したSi微粒子界面の高分解能観察とモデル化

奥井 学, 齋藤 智浩, 石川 由加里, 柴田 典義, 幾原 雄一

doi:10.2109/jcersj.106.1255

書誌事項

タイトル別名

High Resolution TEM Observation of Si Nanoparticle Interfaces Fabricated by SIMOX
SIMOXホウデサクセイシタ Si ビリュウシカイメンノコウブンカイノウカンサツトモデルカ

この論文をさがす

説明

Highly-oriented Si nanoparticles (SNP) were precipitated in amorphous SiO₂ using separation by implanted oxygen (SIMOX) method and showed visible luminescence at room temperature. In order to investigate the microstructure of the SNPs, we observed the Si/SiO₂ interface by cross-sectional high-resolution transmission electron microscopy (HRTEM). The three-dimensional shape of the SNPs observed from different directions is an {111}-surrounded octahedral structure, each apex of which has an {100} facet. The upper (surface-side) interface of SiO₂/Si(100) contains missing atomic rows, while the lower (substrate-side) interface of Si(100)/SiO₂ is atomically flat except for the steps at the intersection with (111) plane. Similar atomically sharp structures were observed at the Si{111}/SiO₂ interfaces. Image-simulation of the interfaces well reproduced the microstructures observed by HRTEM and proved that the interfaces are those of amorphous SiO₂ and single-crystal Si without any intermediate layer.

収録刊行物

Journal of the Ceramic Society of Japan (日本セラミックス協会学術論文誌)

Journal of the Ceramic Society of Japan (日本セラミックス協会学術論文誌) 106 (1240), 1255-1258, 1998

公益社団法人日本セラミックス協会

キーワード

詳細情報詳細情報について

書き出し

問題の指摘