Raman Spectra of Silica Gel Prepared from Triethoxysilane and Tetraethoxysilane by the Sol-Gel Method

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  • MATSUI Kazunori
    Department of Industrial Chemistry, Kanto Gakuin University
  • SATOH Hisao
    Basic High-Technology Research Laboratories, Sumitomo Electric Industries, Ltd.
  • KYOTO Michihisa
    Basic High-Technology Research Laboratories, Sumitomo Electric Industries, Ltd.

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  • トリエトキシシラン-テトラエトキシシランを用いてゾル-ゲル法で作製したシリカゲルのラマンスペクトル
  • Raman Spectra Silica Gel Prepared from

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The silica gels derived from triethoxysilane and tetraethoxysilane were studied by Raman spectroscopy. The vibrational band at 492cm-1, ordinally labeled D1, was shifted to 506cm-1 with the introduction of Si-H groups into the silica network. This suggests that this band is ascribable to the symmetric stretch oxygen vibration of three oxygen atoms connected to a silicon atom with a terminal group, as proposed by Mulder and Damen for fluorine-doped silica (D0) [C. A. M. Mulder and A. A. J. M. Damen, J. Non-Cryst. Solids, 93, 387-394 (1987)]. However, a simple harmonic oscillator model, which Mulder and Damen successfully applied for fluorine-doped silica, does not explain the observed vibrational frequency. Judging from the structural similarity between gels derived from triethoxymethylsilane composed of four-membered siloxane rings and triethoxysilane, we consider that four-membered siloxane rings are more plausible than three oxygen atoms connected to a silicon atom with a terminal Si-H as the origin of the Raman band at 506cm-1 of gels derived from triethoxysilane.

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