書誌事項
- タイトル別名
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- Effect of Preformed Silica Protective Film on Oxidation Behavior of SiC Ceramics during Soaking in Oxygen-Deficient Atmosphere
- Effect of Preformed Silica Protective F
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Effect of preformed silica protective film on the oxidation behavior of porous SiC ceramics at 1700K in Ar-O2 atmosphere with PO<sub>2</sub> in the active oxidation range was investigated and following results were obtained.<br>(1) when the inner pore surface of the ceramics was incompletely covered by the silica layer, CO evolution rate exhibited a peak indicative of the occurrence of the active oxidation soon after the dropping operation for PO<sub>2</sub> from 2 or 10kPa to 0.02kPa. This active oxidation accompanied the silica reduction.<br>(2) The sample oxidized for 10h at PO<sub>2</sub>=10kPa showed no peaking in the CO evolution rate after the PO<sub>2</sub> dropping operation. Thickness of the silica layer of this oxidized sample was about 0.2μm. This sample showed no weight change during the successive soaking for 10h at PO<sub>2</sub>=0.02kPa.<br>(3) As the scheme without the weight change during the soaking in the oxygen-deficient atmosphere, the following reaction was assumed, SiC+4/3O2→2/3SiO2+1/3SiO(g)+CO<br>This reaction forcing the volume increase in the reacting zone, was assumed to contribute to the preservation of the silica protective film.<br>(4) It was pointed out that, in the case of the well-passivated SiC ceramics, at least minor correction should be done in Gulbransen's theory which is known to be valid for the fresh ceramics.
収録刊行物
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- Journal of the Ceramic Society of Japan (日本セラミックス協会学術論文誌)
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Journal of the Ceramic Society of Japan (日本セラミックス協会学術論文誌) 105 (1227), 957-962, 1997
公益社団法人 日本セラミックス協会
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詳細情報 詳細情報について
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- CRID
- 1390001205279315456
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- NII論文ID
- 110002289355
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- NII書誌ID
- AN10040326
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- ISSN
- 18821022
- 09145400
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- NDL書誌ID
- 4334544
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- データソース種別
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- JaLC
- NDL
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