Equilibrium of dissolving species in aqueous H2SiF6 solution during the liquid phase deposition reaction
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- MIZUHATA Minoru
- Department of Chemical Science and Engineering, Graduate School of Engineering, Kobe University
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- SAITO Yasuhiro
- Department of Chemical Science and Engineering, Graduate School of Engineering, Kobe University
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- TAKEE Masao
- Department of Chemical Science and Engineering, Graduate School of Engineering, Kobe University
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- DEKI Shigehito
- Department of Chemical Science and Engineering, Graduate School of Engineering, Kobe University
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The equilibrium reaction of H2SiF6 solution in the LPD method was investigated by the measurement of UV and IR spectroscopies, vapor pressure and electric conductivity. These measurements were carried out by adding the F- scavenger such as H3BO3 and Al metal which shifts the equilibrium reaction. The experimental results strongly suggested the presence of SiF4 and [SiF6·SiF4]2- in H2SiF6 solution. These species were estimated to be involved in the LPD process as intermediates and important for controlling the deposition process of metal oxide.
収録刊行物
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- Journal of the Ceramic Society of Japan
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Journal of the Ceramic Society of Japan 117 (1363), 335-339, 2009
公益社団法人 日本セラミックス協会
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詳細情報 詳細情報について
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- CRID
- 1390001205282557824
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- NII論文ID
- 110007123875
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- NII書誌ID
- AA12229489
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- ISSN
- 13486535
- 18820743
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- NDL書誌ID
- 10163690
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可